JPS6238313B2 - - Google Patents

Info

Publication number
JPS6238313B2
JPS6238313B2 JP58016008A JP1600883A JPS6238313B2 JP S6238313 B2 JPS6238313 B2 JP S6238313B2 JP 58016008 A JP58016008 A JP 58016008A JP 1600883 A JP1600883 A JP 1600883A JP S6238313 B2 JPS6238313 B2 JP S6238313B2
Authority
JP
Japan
Prior art keywords
vanadium
film
vanadium oxide
glass
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58016008A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58135154A (ja
Inventor
Baanaado Guriinbaagu Chaaruzu
Kebin Sukyanron Jeimuzu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PPG Industries Inc
Original Assignee
PPG Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PPG Industries Inc filed Critical PPG Industries Inc
Publication of JPS58135154A publication Critical patent/JPS58135154A/ja
Publication of JPS6238313B2 publication Critical patent/JPS6238313B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/218—V2O5, Nb2O5, Ta2O5
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C03C2218/324—De-oxidation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
JP58016008A 1982-02-01 1983-02-01 酸化バナジウムコ−ティング製品 Granted JPS58135154A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US344906 1982-02-01
US344860 1982-02-01
US06/344,257 US4393095A (en) 1982-02-01 1982-02-01 Chemical vapor deposition of vanadium oxide coatings
US344257 1982-02-01

Publications (2)

Publication Number Publication Date
JPS58135154A JPS58135154A (ja) 1983-08-11
JPS6238313B2 true JPS6238313B2 (en]) 1987-08-17

Family

ID=23349727

Family Applications (3)

Application Number Title Priority Date Filing Date
JP58016008A Granted JPS58135154A (ja) 1982-02-01 1983-02-01 酸化バナジウムコ−ティング製品
JP62062350A Pending JPS62256743A (ja) 1982-02-01 1987-03-17 サ−モクロミツクウインドガラスの製法
JP62062349A Pending JPS62256742A (ja) 1982-02-01 1987-03-17 酸化バナジウムフイルムの化学蒸着法

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP62062350A Pending JPS62256743A (ja) 1982-02-01 1987-03-17 サ−モクロミツクウインドガラスの製法
JP62062349A Pending JPS62256742A (ja) 1982-02-01 1987-03-17 酸化バナジウムフイルムの化学蒸着法

Country Status (4)

Country Link
US (1) US4393095A (en])
JP (3) JPS58135154A (en])
BE (1) BE895752A (en])
CA (1) CA1198019A (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH041926U (en]) * 1990-04-23 1992-01-09

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US4844773A (en) * 1987-07-16 1989-07-04 Texas Instruments Incorporated Process for etching silicon nitride film
US4838984A (en) * 1987-07-16 1989-06-13 Texas Instruments Incorporated Method for etching films of mercury-cadmium-telluride and zinc sulfid
US4818326A (en) * 1987-07-16 1989-04-04 Texas Instruments Incorporated Processing apparatus
US4832779A (en) * 1987-07-16 1989-05-23 Texas Instruments Incorporated Processing apparatus
US4832778A (en) * 1987-07-16 1989-05-23 Texas Instruments Inc. Processing apparatus for wafers
US4830700A (en) * 1987-07-16 1989-05-16 Texas Instruments Incorporated Processing apparatus and method
US4842687A (en) * 1987-07-16 1989-06-27 Texas Instruments Incorporated Method for etching tungsten
US4867841A (en) * 1987-07-16 1989-09-19 Texas Instruments Incorporated Method for etch of polysilicon film
US4849067A (en) * 1987-07-16 1989-07-18 Texas Instruments Incorporated Method for etching tungsten
US4816098A (en) * 1987-07-16 1989-03-28 Texas Instruments Incorporated Apparatus for transferring workpieces
US4857132A (en) * 1987-07-16 1989-08-15 Texas Instruments Incorporated Processing apparatus for wafers
US4822450A (en) * 1987-07-16 1989-04-18 Texas Instruments Incorporated Processing apparatus and method
US4863558A (en) * 1987-07-16 1989-09-05 Texas Instruments Incorporated Method for etching tungsten
US4832777A (en) * 1987-07-16 1989-05-23 Texas Instruments Incorporated Processing apparatus and method
US4855160A (en) * 1987-07-16 1989-08-08 Texas Instruments Incorporated Method for passivating wafer
US4855016A (en) * 1987-07-16 1989-08-08 Texas Instruments Incorporated Method for etching aluminum film doped with copper
US4838990A (en) * 1987-07-16 1989-06-13 Texas Instruments Incorporated Method for plasma etching tungsten
US4830705A (en) * 1987-07-16 1989-05-16 Texas Instruments Incorporated Method for etch of GaAs
US4828649A (en) * 1987-07-16 1989-05-09 Texas Instruments Incorporated Method for etching an aluminum film doped with silicon
US4820377A (en) * 1987-07-16 1989-04-11 Texas Instruments Incorporated Method for cleanup processing chamber and vacuum process module
US4837113A (en) * 1987-07-16 1989-06-06 Texas Instruments Incorporated Method for depositing compound from group II-VI
US4842676A (en) * 1987-07-16 1989-06-27 Texas Instruments Incorporated Process for etch of tungsten
US4872938A (en) * 1987-07-16 1989-10-10 Texas Instruments Incorporated Processing apparatus
US4904621A (en) * 1987-07-16 1990-02-27 Texas Instruments Incorporated Remote plasma generation process using a two-stage showerhead
US4842686A (en) * 1987-07-17 1989-06-27 Texas Instruments Incorporated Wafer processing apparatus and method
JP2588910B2 (ja) * 1987-10-26 1997-03-12 日本板硝子株式会社 改良された調光体
US5318108A (en) * 1988-04-15 1994-06-07 Midwest Research Institute Gas-controlled dynamic vacuum insulation with gas gate
US4988533A (en) * 1988-05-27 1991-01-29 Texas Instruments Incorporated Method for deposition of silicon oxide on a wafer
JPH0723235B2 (ja) * 1989-02-23 1995-03-15 旭硝子株式会社 熱線反射物品
US5274241A (en) * 1990-07-19 1993-12-28 Westinghouse Electric Corp. Optical and electromagnetic field
US5103103A (en) * 1990-07-19 1992-04-07 Westinghouse Electric Corp. Microwave shield
JP2735147B2 (ja) * 1994-06-08 1998-04-02 工業技術院長 サーモクロミック材料の製造法
JP2764539B2 (ja) * 1994-06-24 1998-06-11 工業技術院長 サーモクロミック材料の製造方法
US5580662A (en) * 1995-03-09 1996-12-03 Chunghwa Picture Tubes, Ltd. Antistatic coating for video display screen
US5572086A (en) * 1995-05-18 1996-11-05 Chunghwa Picture Tubes, Ltd. Broadband antireflective and antistatic coating for CRT
FR2738813B1 (fr) * 1995-09-15 1997-10-17 Saint Gobain Vitrage Substrat a revetement photo-catalytique
US5652477A (en) * 1995-11-08 1997-07-29 Chunghwa Picture Tubes, Ltd. Multilayer antistatic/antireflective coating for display device
US5773150A (en) * 1995-11-17 1998-06-30 Chunghwa Picture Tubes, Ltd. Polymeric antistatic coating for cathode ray tubes
GB9619781D0 (en) * 1996-09-23 1996-11-06 Secr Defence Multi layer interference coatings
US7096692B2 (en) * 1997-03-14 2006-08-29 Ppg Industries Ohio, Inc. Visible-light-responsive photoactive coating, coated article, and method of making same
US20030039843A1 (en) * 1997-03-14 2003-02-27 Christopher Johnson Photoactive coating, coated article, and method of making same
US20020155299A1 (en) 1997-03-14 2002-10-24 Harris Caroline S. Photo-induced hydrophilic article and method of making same
US5989514A (en) * 1997-07-21 1999-11-23 Nanogram Corporation Processing of vanadium oxide particles with heat
US6579612B1 (en) 1999-06-24 2003-06-17 International Business Machines Corporation Magnetostrictive sensor structure
FR2809388B1 (fr) * 2000-05-23 2002-12-20 Saint Gobain Vitrage Vitrage comprenant au moins une couche a proprietes thermochromes
US7323249B2 (en) * 2000-08-31 2008-01-29 Ppg Industries Ohio, Inc. Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
US6677063B2 (en) 2000-08-31 2004-01-13 Ppg Industries Ohio, Inc. Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
US6623662B2 (en) 2001-05-23 2003-09-23 Chunghwa Picture Tubes, Ltd. Carbon black coating for CRT display screen with uniform light absorption
US6746530B2 (en) 2001-08-02 2004-06-08 Chunghwa Pictures Tubes, Ltd. High contrast, moisture resistant antistatic/antireflective coating for CRT display screen
JP3849008B2 (ja) * 2001-09-20 2006-11-22 独立行政法人産業技術総合研究所 高性能自動調光窓コーティング材料
US6521346B1 (en) 2001-09-27 2003-02-18 Chunghwa Picture Tubes, Ltd. Antistatic/antireflective coating for video display screen with improved refractivity
US6764580B2 (en) * 2001-11-15 2004-07-20 Chungwa Picture Tubes, Ltd. Application of multi-layer antistatic/antireflective coating to video display screen by sputtering
US6656331B2 (en) 2002-04-30 2003-12-02 Chunghwa Picture Tubes, Ltd. Application of antistatic/antireflective coating to a video display screen
JP4533996B2 (ja) * 2005-01-28 2010-09-01 独立行政法人産業技術総合研究所 高断熱自動調光ガラス及びその製造方法
TWI252150B (en) * 2005-03-22 2006-04-01 Speed Tech Corp In mold decoration fabrication of injection molding
KR100842287B1 (ko) * 2006-07-06 2008-06-30 한국전자통신연구원 급격한 금속-절연체 전이를 갖는 ｖ2ｏ3 박막의 제조방법
WO2008004787A1 (en) * 2006-07-06 2008-01-10 Electronics And Telecommunications Research Institute Method of forming vanadium trioxide thin film showing abrupt metal-insulator transition
US7761053B2 (en) * 2006-09-08 2010-07-20 Mpb Communications Inc. Variable emittance thermochromic material and satellite system
DE102007061272A1 (de) 2007-12-19 2009-06-25 Schott Ag Schichten, insbesondere photonische Schichten, enthaltend thermochrome Verbindungen, auf Glas- oder Glaskeramiksubstraten
WO2011118700A1 (ja) * 2010-03-24 2011-09-29 独立行政法人産業技術総合研究所 光学用二酸化バナジウム薄膜の製造方法
US8334161B2 (en) * 2010-07-02 2012-12-18 Sunpower Corporation Method of fabricating a solar cell with a tunnel dielectric layer
EP2450322A1 (en) * 2010-09-13 2012-05-09 Korea Electronics Technology Institute Double window / door system for blocking infrared rays
US9952096B2 (en) 2012-06-05 2018-04-24 President And Fellows Of Harvard College Ultra-thin optical coatings and devices and methods of using ultra-thin optical coatings
CN103014701A (zh) * 2012-12-22 2013-04-03 蚌埠玻璃工业设计研究院 一种二氧化钒薄膜的制备方法
CN106892573A (zh) * 2017-03-20 2017-06-27 武汉理工大学 一种环保型热致变色二氧化钒薄膜的制备方法
CN108515009A (zh) * 2018-04-12 2018-09-11 四川星明能源环保科技有限公司 A相二氧化钒薄膜及其制备方法
WO2021168017A1 (en) * 2020-02-18 2021-08-26 The Regents Of The University Of California Flexible and tunable infrared emissivity material platform
TW202208656A (zh) 2020-05-11 2022-03-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 減輕方法及反應器系統
US20230417101A1 (en) * 2022-06-28 2023-12-28 Greg Eguaoje Transition glass
CN116655255B (zh) * 2023-08-01 2023-10-13 中国耀华玻璃集团有限公司 一种易清洁的温致节能阳光控制膜玻璃及在线生产方法

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH041926U (en]) * 1990-04-23 1992-01-09

Also Published As

Publication number Publication date
JPS58135154A (ja) 1983-08-11
JPS62256742A (ja) 1987-11-09
CA1198019A (en) 1985-12-17
JPS62256743A (ja) 1987-11-09
US4393095A (en) 1983-07-12
BE895752A (fr) 1983-08-01

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